1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Wafer level microarcing model in chemical-vapor deposition low- via etch on silicon-on-insulator substrate
Rent:
Rent this article for
USD
10.1116/1.2187990
/content/avs/journal/jvsta/24/4/10.1116/1.2187990
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/4/10.1116/1.2187990
/content/avs/journal/jvsta/24/4/10.1116/1.2187990
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/avs/journal/jvsta/24/4/10.1116/1.2187990
2006-06-22
2015-03-05
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Wafer level microarcing model in 90nm chemical-vapor deposition low-k via etch on 300mm silicon-on-insulator substrate
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/4/10.1116/1.2187990
10.1116/1.2187990
SEARCH_EXPAND_ITEM