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Type of precursor and synthesis of silicon oxycarbide thin films with a surfatron microwave oxygen/argon plasma
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10.1116/1.2204927
/content/avs/journal/jvsta/24/4/10.1116/1.2204927
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/4/10.1116/1.2204927

Figures

Image of FIG. 1.
FIG. 1.

Deposition rate as a function of oxygen flow of thin films prepared from HMDSO, TMS, and DMS as precursors.

Image of FIG. 2.
FIG. 2.

FTIR absorption spectra of films deposited from HMDSO, TMS, and DMS as precursors for different oxygen flows in the gas mixture as indicated.

Image of FIG. 3.
FIG. 3.

Atomic concentrations determined from the area of Si , C , and O peaks in the XPS spectra of the films deposited from (a)HMDSO, (b) TMS, and (c) DMS at different oxygen concentrations.

Image of FIG. 4.
FIG. 4.

Atomic ratio in the films as a function of oxygen flow for the films deposited from HMDSO, TMS, and DMS as precursors.

Image of FIG. 5.
FIG. 5.

Auger parameter of films as a function of the ratio for the thin films deposited from HMDSO and TMS.

Image of FIG. 6.
FIG. 6.

Optical band gap for the films as a function of the ratio for the thin films deposited from HMDSO, TMS, and DMS.

Image of FIG. 7.
FIG. 7.

Water contact angle for the films as a function of ratio for the thin films deposited from HMDSO, TMS, and DMS. The inset shows in an enlarged scale the zone for a contact angle smaller than 2.

Image of FIG. 8.
FIG. 8.

Surface free energy as a function of atomic concentration ratio for the thin films deposited from (left) HMDSO, (middle) TMS, and (right) DMS. Curves for the polar and dispersive contributions to the surface free energy are also reported.

Tables

Generic image for table
TABLE I.

Infrared absorption bands detected in the absorption spectra deposited from different precursors.

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/content/avs/journal/jvsta/24/4/10.1116/1.2204927
2006-05-22
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Type of precursor and synthesis of silicon oxycarbide (SiOxCyH) thin films with a surfatron microwave oxygen/argon plasma
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/4/10.1116/1.2204927
10.1116/1.2204927
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