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Silicon dioxide etching process for fabrication of micro-optics employing pulse-modulated electron-beam-excited plasma
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10.1116/1.2217979
/content/avs/journal/jvsta/24/5/10.1116/1.2217979
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/5/10.1116/1.2217979
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic of an experimental setup with a pulse-modulated EBEP or dc EBEP.

Image of FIG. 2.
FIG. 2.

Surface temperature of the etched substrate as a function of the duty ratio of .

Image of FIG. 3.
FIG. 3.

(a)Distribution of the ion current densities and (b) FWHM of distribution of the ion current densities as a function of the duty ratio of .

Image of FIG. 4.
FIG. 4.

Time resolved optical emission intensity as a function of the duty ratio of , (a) Ar optical emission intensity, (b) F optical emission intensity, and (c) optical emission intensity.

Image of FIG. 5.
FIG. 5.

Comparison between the time resolved Ar emission intensity and the time resolved emission intensity.

Image of FIG. 6.
FIG. 6.

Time averaged optical emission intensity around the ultraviolet region.

Image of FIG. 7.
FIG. 7.

and F densities as a function of the duty ratio of measured by actinometry.

Image of FIG. 8.
FIG. 8.

Scanning electron microscope (SEM) image of etched profiles of the patterned substrate, etched profile of (a) center and (b) edge areas on the etched substrate surface with dc controlled EBEP, and etched profile of (c) center and (d) edge areas on the etched substrate surface with pulse-modulated EBEP.

Image of FIG. 9.
FIG. 9.

Process sequence for fabrication of the end surface of the optical fiber.

Image of FIG. 10.
FIG. 10.

Microfabrication of core area in diameter on end surface of optical fiber. (a) SEM image of etched optical fiber and (b) enlargement of (a).

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/content/avs/journal/jvsta/24/5/10.1116/1.2217979
2006-08-02
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Silicon dioxide etching process for fabrication of micro-optics employing pulse-modulated electron-beam-excited plasma
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/5/10.1116/1.2217979
10.1116/1.2217979
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