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Zinc oxide-based transparent conductive oxide films prepared by pulsed magnetron sputtering from powder targets: Process features and film properties
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10.1116/1.2218857
/content/avs/journal/jvsta/24/5/10.1116/1.2218857
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/5/10.1116/1.2218857

Figures

Image of FIG. 1.
FIG. 1.

Schematic representation of “powder target” deposition rig.

Image of FIG. 2.
FIG. 2.

SEM micrographs of the fracture section of (a) Al coating and (b) Ga coating deposited on glass substrates from blended powder targets.

Image of FIG. 3.
FIG. 3.

Variation in coating resistivity with dopant materials and dopant level for annealed ZnO-based TCO coatings deposited from blended powder targets.

Image of FIG. 4.
FIG. 4.

Postannealing XRD spectra for doped ZnO coatings deposited on glass substrates from blended powder targets.

Image of FIG. 5.
FIG. 5.

(a) Postannealing transmittance spectra for Al-, Ga-, and In-doped ZnO coatings deposited on glass substrates from blended powder targets. (b) Postannealing transmittance spectra for Sb- and Sn-doped ZnO coatings deposited on glass substrates from blended powder targets.

Image of FIG. 6.
FIG. 6.

Variation in substrate current with substrate bias voltage operating in closed field and single magnetron modes.

Image of FIG. 7.
FIG. 7.

Variation in substrate current with target current operating in closed field and single magnetron modes.

Image of FIG. 8.
FIG. 8.

SEM micrographs of the fracture section of Al coatings deposited in (a) closed field and pulsed dc modes, (b) single magnetron and pulsed dc modes, (c) closed field and continuous dc modes, and (d) single magnetron and continuous dc modes.

Tables

Generic image for table
TABLE I.

Deposition rate and postdeposition resistivity and peak shift data for doped ZnO coatings. ( beyond range of instrument: X: coating delaminated after annealing.)

Generic image for table
TABLE II.

Hall probe data for selected doped ZnO coatings.

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/content/avs/journal/jvsta/24/5/10.1116/1.2218857
2006-08-03
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Zinc oxide-based transparent conductive oxide films prepared by pulsed magnetron sputtering from powder targets: Process features and film properties
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/5/10.1116/1.2218857
10.1116/1.2218857
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