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Growth and characterization of chromium oxide thin films prepared by reactive ac magnetron sputtering
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10.1116/1.2244536
/content/avs/journal/jvsta/24/5/10.1116/1.2244536
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/5/10.1116/1.2244536

Figures

Image of FIG. 1.
FIG. 1.

Schematic of dual inverted cylindrical magnetrons in the ICM-10 ac sputtering deposition system.

Image of FIG. 2.
FIG. 2.

UV-visible transmission spectrum of chromium oxide coating on a glass substrate (sample 1).

Image of FIG. 3.
FIG. 3.

Room temperature x-ray diffractograms for coatings deposited on glass substrate (sample 1) and three silicon substrates (samples 2–4).

Image of FIG. 4.
FIG. 4.

Relative intensity for XRD peaks in samples 1–4 for seven crystal orientations compared with the intensity values in the powder diffraction files for (Ref. 20). (Measurements were done using grazing incidence angle x-ray diffraction configuration.)

Image of FIG. 5.
FIG. 5.

High temperature in situ XRD patterns of coating on Si substrate (sample 2).

Image of FIG. 6.
FIG. 6.

Relative intensity for XRD peaks in samples 2 before and after its heat treatment for different crystal orientations compared with the intensity values in the powder diffraction files for (Ref. 20). (Measurements were done using Bragg-Brenttano configuration.)

Image of FIG. 7.
FIG. 7.

XRD patterns of (sample 6), (sample 5), and (sample 4). Peaks labeled as “o” are due to prelayer on Si. Peaks due to different phases of alumina are labeled as , , , and .

Image of FIG. 8.
FIG. 8.

Surface morphology of thin film deposited on a glass substrate (sample 1).

Image of FIG. 9.
FIG. 9.

Surface morphology of thin film deposited on silicon substrate (sample 2) before its heat treatment.

Image of FIG. 10.
FIG. 10.

Surface morphology of coating on silicon substrate (sample 2) after its heat treatment up to .

Image of FIG. 11.
FIG. 11.

Cr and O atomic fractions in sample 2 as a function of coating depth.

Image of FIG. 12.
FIG. 12.

Argon and hydrogen impurity concentrations in sample 2 as a function of coating depth.

Tables

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TABLE I.

Conditions used for the deposition of chromium oxide coatings.

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TABLE II.

Conditions used for the deposition of alumina coatings.

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TABLE III.

Details of samples prepared and studied.

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TABLE IV.

Thickness of thin film samples.

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TABLE V.

Crystallite size in coating (sample 2) at different temperatures as determined by in situ high temperature XRD studies.

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/content/avs/journal/jvsta/24/5/10.1116/1.2244536
2006-08-14
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth and characterization of chromium oxide thin films prepared by reactive ac magnetron sputtering
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/5/10.1116/1.2244536
10.1116/1.2244536
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