1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Measurement of Cu atom density in a magnetron sputtering plasma source using an YBaCuO target by laser-induced fluorescence imaging spectroscopy
Rent:
Rent this article for
USD
10.1116/1.2353850
/content/avs/journal/jvsta/24/6/10.1116/1.2353850
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/6/10.1116/1.2353850
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of the experimental apparatus.

Image of FIG. 2.
FIG. 2.

Two-dimensional distributions of Cu atom densities observed at rf powers of (a) and (b) . The discharge gas was pure Ar at a pressure of . The measurement was carried out by changing the rf power from with keeping the discharge.

Image of FIG. 3.
FIG. 3.

Dependence of the Cu density on the rf power. The broken and dotted curves were obtained when the measurements were started from 15 and , respectively. The discharge gas was pure Ar at a pressure of .

Image of FIG. 4.
FIG. 4.

Temporal variations of Cu densities observed at rf powers of 30, 50, and . The discharge gas was pure Ar at a pressure of .

Image of FIG. 5.
FIG. 5.

Temporal variation of Cu atom density at various rf powers observed in a continuous discharge. The discharge gas was pure Ar at a pressure of .

Image of FIG. 6.
FIG. 6.

Two-dimensional distributions of Cu atom densities observed in mixture discharges at flow rate ratios of (a) 0.7% and (b) 7.4%. The rf power and the total gas pressures were and , respectively.

Image of FIG. 7.
FIG. 7.

Relationship between the Cu density and the flow rate ratio of in mixture discharge. The rf power and the total gas pressures were and , respectively.

Image of FIG. 8.
FIG. 8.

Comparison of the temporal variations of the Cu atom densities observed in a pure Ar discharge and in an mixture discharge with an flow rate ratio of 0.7%. The rf power and the gas pressures were and , respectively.

Loading

Article metrics loading...

/content/avs/journal/jvsta/24/6/10.1116/1.2353850
2006-10-11
2014-04-16
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Measurement of Cu atom density in a magnetron sputtering plasma source using an YBaCuO target by laser-induced fluorescence imaging spectroscopy
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/24/6/10.1116/1.2353850
10.1116/1.2353850
SEARCH_EXPAND_ITEM