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Crystalline alumina coatings by reactive ac magnetron sputtering
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10.1116/1.2431353
/content/avs/journal/jvsta/25/2/10.1116/1.2431353
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/2/10.1116/1.2431353

Figures

Image of FIG. 1.
FIG. 1.

XRD patterns of alumina films deposited at three flow rate ratios.

Image of FIG. 2.
FIG. 2.

atomic ratio as a function of depth in alumina films deposited at three flow rate ratios.

Image of FIG. 3.
FIG. 3.

Hydrogen concentration as a function of depth in alumina films deposited at three flow rate ratios.

Tables

Generic image for table
TABLE I.

Deposition parameters used for the preparation of alumina films on Si substrates.

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/content/avs/journal/jvsta/25/2/10.1116/1.2431353
2007-01-29
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Crystalline alumina coatings by reactive ac magnetron sputtering
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/2/10.1116/1.2431353
10.1116/1.2431353
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