Sputtering facility schematic.
Ion beam diagnostics.
Pretest and post-test beam current density profile for ions.
Constant current lines (nA) for a ion beam, mapped as a function of deflection voltage.
SEM image revealing surface topography of a Mo film.
SEM image of a cross section of a crystal fractured in liquid nitrogen.
X-ray diffraction scans of Mo coated and blank QCMs.
Measured Mo film thickness change during bombardment by ions.
normal incidence sputtering yield measurements for .
Cu and W sputtering yield measurements for ion bombardment at normal incidence.
Sputtering yield variation for as a function of angle of incidence.
Cu and W film deposition parameters.
Normal incidence yield measurements.
Angular dependence of sputtering yields.
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