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On the interest of carbon-coated plasma reactor for advanced gate stack etching processes
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10.1116/1.2464126
/content/avs/journal/jvsta/25/2/10.1116/1.2464126
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/2/10.1116/1.2464126
/content/avs/journal/jvsta/25/2/10.1116/1.2464126
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/content/avs/journal/jvsta/25/2/10.1116/1.2464126
2007-02-20
2015-03-06
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: On the interest of carbon-coated plasma reactor for advanced gate stack etching processes
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/2/10.1116/1.2464126
10.1116/1.2464126
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