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Comparison of surface reactivity of CN, NH, and radicals during deposition of amorphous carbon nitride films from inductively coupled rf plasmas
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10.1116/1.2699216
/content/avs/journal/jvsta/25/2/10.1116/1.2699216
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/2/10.1116/1.2699216
/content/avs/journal/jvsta/25/2/10.1116/1.2699216
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/content/avs/journal/jvsta/25/2/10.1116/1.2699216
2007-02-28
2014-08-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparison of surface reactivity of CN, NH, and NH2 radicals during deposition of amorphous carbon nitride films from inductively coupled rf plasmas
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/2/10.1116/1.2699216
10.1116/1.2699216
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