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Comparison of surface reactivity of CN, NH, and radicals during deposition of amorphous carbon nitride films from inductively coupled rf plasmas
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10.1116/1.2699216
/content/avs/journal/jvsta/25/2/10.1116/1.2699216
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/2/10.1116/1.2699216

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of the instrument used for collection of mass spectrometry data for ICPs used to deposit films.

Image of FIG. 2.
FIG. 2.

(a) Experimental fluorescence excitation spectrum of the (0,0) transition of CN in a 60:40 . The spectrum was acquired using steps on the dye laser. (b) Calculated fluorescence excitation spectrum of the (0,0) transition of CN with .

Image of FIG. 3.
FIG. 3.

(a) LIF intensity of CN, NH, and as a function of fraction in plasmas at . Pressure was in the plasma source. (b) The CN LIF intensities in and plasmas at as a function of or fraction. Pressure was in the plasma source.

Image of FIG. 4.
FIG. 4.

Two-dimensional ICCD images of CN LIF signals in (a) a 60:40 plasma beam and (b) with a Si substrate rotated into the path of the molecular beam. The image shown in (c) is the difference between the images shown in (a) and (b) and shows only CN radicals scattered from the surface. The metal substrate holder was grounded and the total pressure in the plasma source was . Dashed lines indicate the locations of the molecular beam and the laser beam.

Image of FIG. 5.
FIG. 5.

Two-dimensional ICCD images of NH LIF signals in (a) a 40:60 plasma beam and (b) with a Si substrate rotated into the path of the molecular beam. The image shown in (c) is the difference between the images shown in (a) and (b) and shows only CN radicals scattered from the surface. The metal substrate holder was grounded and the total pressure in the plasma source was . Dashed lines indicate the locations of the molecular beam and the laser beam.

Image of FIG. 6.
FIG. 6.

(a) Cross-sectional data for the LIF of CN data shown in Figs. 4(a) and 4(c). Dashed lines represent the simulated curves from the geometric model assuming . (b) Cross-sectional data for the LIF of NH data shown in Figs. 6(a) and 6(c). Dashed lines represent the simulated curves from the geometric model assuming . (c) Cross-sectional data for the LIF of in the incident molecular beam and scattered from a film surface using a 40:60 plasma at . Dashed lines represent the simulated curves from the geometric model assuming .

Image of FIG. 7.
FIG. 7.

Surface reactivity of CN, NH, and NH for interactions with film surface as a function of or fraction. The total pressure in the or plasma source was . Data were taken with the substrate grounded (squares) or with bias voltage (circles).

Image of FIG. 8.
FIG. 8.

Surface reactivity of CN for interactions with film surface as a function of applied rf power. The total pressure in the plasma source was , and the fraction was 60%. Data were taken with the substrate grounded (squares) or with bias voltage (circles).

Image of FIG. 9.
FIG. 9.

Typical mass spectra of the positive ion species in (a) 100% , (b) 30:40 , and (c) 30:40 ICPs, at a total pressure of at .

Image of FIG. 10.
FIG. 10.

Energy distributions of the , , , and ions in pure ICPs at the total pressure of and applied rf powers of (a) and (b) .

Image of FIG. 11.
FIG. 11.

Energy distributions of ions produced at the pure pressures of (a) and (b) , and .

Tables

Generic image for table
TABLE I.

Relevant , , and electron impact reactions.

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/content/avs/journal/jvsta/25/2/10.1116/1.2699216
2007-02-28
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparison of surface reactivity of CN, NH, and NH2 radicals during deposition of amorphous carbon nitride films from inductively coupled rf plasmas
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/2/10.1116/1.2699216
10.1116/1.2699216
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