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Effects of the deposition parameters on the growth of ultrathin and thin films
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10.1116/1.2714958
/content/avs/journal/jvsta/25/3/10.1116/1.2714958
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/3/10.1116/1.2714958

Figures

Image of FIG. 1.
FIG. 1.

Experimental spectra of the ellipsometric functions (open circles) and (open triangles) and the relative best-fit plots (solid lines) in the case of the thin film deposited at for (thickness: ).

Image of FIG. 2.
FIG. 2.

XRR profiles in the case of film deposited at for . Experimental curve (solid line) and calculated one (dotted line).

Image of FIG. 3.
FIG. 3.

Behavior of the film thickness as a function of the deposition time at different substrate temperatures. The continuous lines are linear best fits of the samples deposited at for deposition times shorter and longer than . The dashed lines are linear best fits of the samples deposited at for deposition times shorter and longer than . The inset shows a detail of the time region up to ; the arrows in the inset indicate the position of the critical time.

Image of FIG. 4.
FIG. 4.

C-AFM images of three films deposited for at (a), (b), and (c).

Image of FIG. 5.
FIG. 5.

Behavior of the film roughness as a function of the substrate temperature at two different deposition times: (a) and (b). The error bars are obtained by averaging over several zones of each sample.

Image of FIG. 6.
FIG. 6.

Behavior of the lateral grain size as a function of the substrate temperature at two different deposition times: (a) and (b). The error bars are obtained by averaging over several zones of each sample.

Image of FIG. 7.
FIG. 7.

C-AFM images of three films deposited at for (a), (b), and (c).

Image of FIG. 8.
FIG. 8.

Evolution of the roughness vs time for films deposited at (open circles) and (open squares).

Image of FIG. 9.
FIG. 9.

Values of the “critical thickness” (filled circles) and of the corresponding film roughness (open circles) vs the substrate temperature.

Tables

Generic image for table
TABLE I.

Best-fit results of the XRR profile analysis of films deposited at . Thickness , root mean square roughness , and layer density .

Generic image for table
TABLE II.

Roughness and grain dimensions of some selected films, determined by means of AFM scans, as functions of substrate temperature and deposition time.

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/content/avs/journal/jvsta/25/3/10.1116/1.2714958
2007-04-02
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of the deposition parameters on the growth of ultrathin and thin SiO2 films
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/3/10.1116/1.2714958
10.1116/1.2714958
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