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Effects of deposition parameters on the structure of AlN coatings grown by reactive magnetron sputtering
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10.1116/1.2730513
/content/avs/journal/jvsta/25/3/10.1116/1.2730513
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/3/10.1116/1.2730513

Figures

Image of FIG. 1.
FIG. 1.

Schematic of dual hollow cylindrical magnetrons in the ICM-10 coating system.

Image of FIG. 2.
FIG. 2.

Hysteresis effects in the targets’ voltage and current as a function of flow rate at discharge power.

Image of FIG. 3.
FIG. 3.

UV-visible transmission spectra of four AlN films (samples 1, 2, 3, and 7) on glass substrates.

Image of FIG. 4.
FIG. 4.

XRD patterns of AlN films on glass substrates prepared at higher concentration and three sputtering powers (samples 1, 2, and 3).

Image of FIG. 5.
FIG. 5.

XRD patterns of AlN films on silicon substrates prepared at higher concentration and three sputtering powers (samples 4, 5, and 6). Peaks labeled as “h” and “c” are due to hexagonal and cubic phases, respectively.

Image of FIG. 6.
FIG. 6.

XRD patterns of AlN films on glass and silicon substrates (samples 7 and 8) prepared at lower concentration. Peaks labeled as “u” are due to unknown phases.

Image of FIG. 7.
FIG. 7.

Microstructure of AlN coating on glass substrate deposited at sputtering power at two magnifications (sample 1).

Image of FIG. 8.
FIG. 8.

Microstructure of AlN coating on glass substrate deposited at sputtering power at two magnifications (sample 2).

Image of FIG. 9.
FIG. 9.

Microstructure of AlN coating on glass substrate deposited at sputtering power at two magnifications (sample 3).

Image of FIG. 10.
FIG. 10.

Microstructure of AlN coating deposited on glass substrate using lower concentration and sputtering power (sample 7).

Image of FIG. 11.
FIG. 11.

Microstructure of AlN coating deposited on silicon substrate using lower partial pressure and sputtering power (sample 8).

Image of FIG. 12.
FIG. 12.

Composition of AlN coating on a glass substrate as a function of thin film depth (sample 7).

Image of FIG. 13.
FIG. 13.

Composition of AlN coating on a silicon substrate as a function of thin film depth (sample 8).

Image of FIG. 14.
FIG. 14.

Hydrogen impurity concentration in AlN coatings deposited on glass and silicon substrates at lower nitrogen concentration (samples 7 and 8).

Tables

Generic image for table
TABLE I.

Deposition parameters during four growth runs of AlN coatings (each deposition run was carried out for ).

Generic image for table
TABLE II.

Details of samples prepared and studied in this article.

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/content/avs/journal/jvsta/25/3/10.1116/1.2730513
2007-04-20
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of deposition parameters on the structure of AlN coatings grown by reactive magnetron sputtering
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/3/10.1116/1.2730513
10.1116/1.2730513
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