(a) Chemical structures of fluorosilane films deposited on silanized samples. (b) Silanization of silicon and PDMS samples.
Schematic of the apparatus for vapor phase deposition of self-assembled monolayers.
Static contact angle values for various SAMs as a function of temperature, pressure, and deposition time for optimization of the process conditions. The contact angle for oxygen plasma treated PDMS is also shown.
Typical values of rms surface roughness for oxygen plasma treated PDMS substrate and various SAMs.
(a) Water contact angles and adhesive force and coefficient of friction measured using an AFM for untreated and oxygen plasma treated PDMS and various SAMs, and (b) friction force vs normal load plots for untreated and oxygen plasma treated PDMS and various SAMs. The coefficient of friction values for each sample are indicated in parentheses.
(a) Dependence of the coefficient of friction on the relative humidity (RH) for untreated and oxygen plasma treated PDMS substrates and various SAMs, and (b) temperature dependence of the adhesive force.
Dependence of the adhesive force on the sliding velocity for untreated and oxygen plasma treated PDMS substrates and various SAMs.
Decrease in surface height as a function of normal load for untreated PDMS, Si(100), and PFDTES on both substrates after one scan cycle. Typical wear maps at selected loads are also shown.
Summary of optimum deposition condition (chamber pressure, chamber temperature, and deposition time), contact angle, adhesive force, and coefficient of friction for substrates and films.
Bond strengths of the chemical bonds in SAMs.
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