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Optimization of the microcrystalline silicon deposition efficiency
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10.1116/1.2433985
/content/avs/journal/jvsta/25/4/10.1116/1.2433985
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/4/10.1116/1.2433985
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) , , and transitional material (shaded) zones, position of the starting point and effect of flow variation in the space. (b) deposition rate (엯) and Raman crystallinity (●) when the hydrogen flow is decreased, while the silane flow rate and the pressure are kept constant.

Image of FIG. 2.
FIG. 2.

Effect of a pressure increase on (a) and and (b) deposition rate (엯) and Raman crystallinity (●) with constant silane and hydrogen flow rates of 80 and , respectively.

Image of FIG. 3.
FIG. 3.

Multistep experimental results following iso- and iso- curves.

Image of FIG. 4.
FIG. 4.

Flow diagram for deposition optimization.

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/content/avs/journal/jvsta/25/4/10.1116/1.2433985
2007-07-03
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Optimization of the microcrystalline silicon deposition efficiency
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/4/10.1116/1.2433985
10.1116/1.2433985
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