Patterning of high density magnetic nanodot arrays by nanoimprint lithography
(a) Optical image of an imprinted sample with patterned area (dark sqare in the center). (b) and (c) SEM images of a nanodot array with diameter and pitch and of an array with diameter and pitch. (d) The cross section of a sample with diameter features with pitch. (e) A sample with resist bilayers after PMMA residual layer removal and PMGI developing.
SEM images of magnetic nanodot arrays fabricated by bilayer lift-off of a sample with hole arrays at (a) low magnification and (b) high magnification.
In-plane magnetization curves of nanodot arrays and full films (insertion) measured by AGM. The vortex state and the single-domain-like state correspond to and , respectively.
SEM images of imprinted PMMA on Si samples after metallization. (a) A severe crack appearance developed on the surface film after sputtering Au. (b) Cracks were greatly reduced for sputtering alloy. (c) Cracks were completely eliminated for sputtering Ta and then Au.
Formation of metal residues during a bilayer lift-off. (a) Schematic illustration of the mechanisms and (b) SEM images corresponding to the developing times of 15, 30, and .
SEM image of residue-free magnetic nanodot arrays after removing pedestals by a brief post-lift-off ion milling for . This milling also removes about of Ta from the cap and causes a slight rounding of the particle tops.
Plot of nanodot diameters as a function of the duration of oxygen plasma ashing of the resist template. Working pressure is and power is with oxygen flow rate of .
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