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Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers
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10.1116/1.2736679
/content/avs/journal/jvsta/25/4/10.1116/1.2736679
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/4/10.1116/1.2736679
/content/avs/journal/jvsta/25/4/10.1116/1.2736679
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/content/avs/journal/jvsta/25/4/10.1116/1.2736679
2007-05-14
2014-07-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/4/10.1116/1.2736679
10.1116/1.2736679
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