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Room temperature crystallization of indium tin oxide films on glass and polyethylene terephthalate substrates using rf plasma
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10.1116/1.2748807
/content/avs/journal/jvsta/25/4/10.1116/1.2748807
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/4/10.1116/1.2748807
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

X-ray diffraction profiles of thick ITO film before and after plasma treatment.

Image of FIG. 2.
FIG. 2.

X-ray diffraction profiles around (222) bixbite peak of sputtered ITO films treated with Ar plasma in various plasma gas pressures.

Image of FIG. 3.
FIG. 3.

Resistivity change of sputtered ITO films by Ar plasma treatment in various plasma gas pressures. The films correspond to the films represented in Fig. 2 .

Image of FIG. 4.
FIG. 4.

Film temperature during the plasma treatments which correspond to Figs. 2 and 3 .

Image of FIG. 5.
FIG. 5.

X-ray diffraction profiles around (222) bixbite peak of sputtered ITO films treated with Ar plasma in various plasma gas pressures.

Image of FIG. 6.
FIG. 6.

Resistivity change of sputtered ITO films by Ar plasma treatment in various plasma gas pressures. The films correspond to the films represented in Fig. 5 .

Image of FIG. 7.
FIG. 7.

Change of , CO , and concentrations of ambient gas in the sputter chamber during the ITO deposition. The numbers in the brackets at the second topmost line on the figure represent the processes for the construction of a film stack with a layer construction of ITO/ /substrate, see the details in the text.

Image of FIG. 8.
FIG. 8.

X-ray diffraction profiles of sputter-deposited film stack with a layer construction of ITO/ /PET before and after Ar plasma treatment.

Image of FIG. 9.
FIG. 9.

Resistivity change of sputtered ITO films deposited on PET (circle) and glass (square) substrates by Ar plasma treatment. Two ITO films represented in each of the four column boxes were deposited at the same time.

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/content/avs/journal/jvsta/25/4/10.1116/1.2748807
2007-07-02
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Room temperature crystallization of indium tin oxide films on glass and polyethylene terephthalate substrates using rf plasma
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/4/10.1116/1.2748807
10.1116/1.2748807
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