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In situ attenuated total reflectance Fourier transform infrared spectroscopy of hafnium (IV) tert butoxide adsorption onto hydrogen terminated Si (100) and Si (111)
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10.1116/1.2757179
/content/avs/journal/jvsta/25/5/10.1116/1.2757179
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/5/10.1116/1.2757179
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Experimental setup for in situ characterization of CVD reactions.

Image of FIG. 2.
FIG. 2.

Three dimensional atomic groups for calculated spectra (a) bridged HtB on a H terminated Si cluster; (b) monodentate HtB on H terminated Si with one O–H termination; and (c) the HtB molecule.

Image of FIG. 3.
FIG. 3.

OH stretch region for different temperatures at saturation on (a) Si (100) and (b) Si (111). No film is the spectrum of a clean ATR crystal after in atmosphere at room temperature.

Image of FIG. 4.
FIG. 4.

O–H, C–H, and C–O stretching regions for (a) liquid HtB at ; (b) adsorbed HtB at ; (c) adsorbed HtB at ; and (d) liquid t-butanol at on Si (100).

Image of FIG. 5.
FIG. 5.

HtB spectra of (a) monodentate model; (b) bridged model; (c) liquid HtB on Ge; (d) adsorbed HtB on Ge. (a), (b) and (c) are at , and (d) is at .

Image of FIG. 6.
FIG. 6.

(a) C–H stretch of adsorbed HtB on Si (111) at , showing Fourier self-deconvoluted peaks. [(b) and (c)] Deconvoluted C–H stretching at various temperatures on Si (100) and Si (111), respectively.

Image of FIG. 7.
FIG. 7.

Spectra of adsorbed HtB at saturation for different substrate temperatures on (a) Si(100) and (b) Si(111).

Image of FIG. 8.
FIG. 8.

Growth of OH group, CH stretching, CH bending, and characteristic bridged bond with time at on (a) Si(100) and (b) Si(111). The solid lines refer to the primary axis and the dashed to the secondary axis.

Image of FIG. 9.
FIG. 9.

Area of peak between 3118 and (CH stretch) vs time for varying crystal temperatures. (a) Si(100) and (b) Si(111).

Image of FIG. 10.
FIG. 10.

Arrhenius plot for the CH stretch integrated absorbance from on Si(100) and Si(111).

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/content/avs/journal/jvsta/25/5/10.1116/1.2757179
2007-08-01
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ attenuated total reflectance Fourier transform infrared spectroscopy of hafnium (IV) tert butoxide adsorption onto hydrogen terminated Si (100) and Si (111)
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/25/5/10.1116/1.2757179
10.1116/1.2757179
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