Schematic diagrams: (a) arrangement of the substrate holder, cathodes, and the magnets in an HTC 1000–4/ABS PVD coater17 and (b) CrN/NbN coating layer scheme.1
Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and atmosphere as used to deposit the CrN/NbN nanolayer coating.
X-ray diffraction patterns of the CrN/NbN coating deposited by the H-H and the H-U technique.
TEM micrographs of the nanoscale multilayer structure evident for the CrN/NbN coatings deposited by (a) H-H technique, (b) H-U technique, and (c) ABS technique.
TEM micrographs showing microstructure details: (a) defect-free H-H coating and (b) H-U coating evident with intercolumnar voids (highlighted with white markers).
Microstructure of the coatings showing the grain column topography: TEM cross-sectional micrographs showing the grain columns tops of the (a) H-H and the (b) H-U coating. SEM plan view micrographs for the (c) H-H and the (d) H-U coatings.
SEM image of the wear track of the H-H coating. (a) Lower magnification image of the wear track in general. (b) Higher magnification image of the selected area of the wear track shown in the bracket in (a).
Graph of friction coefficient against sliding distance under dry sliding conditions and counterpart: (a) H-H coatings and (b) H-U coatings.
Potentiodynamic polarization curves for the H-H, H-U, ABS coating, and uncoated SS polarized from to in a NaCl solution aerated for 25 min.
Process scheme of different techniques used to deposit nanoscale multilayered CrN/NbN PVD coatings.
Characterization results of nanoscale multilayer CrN/NbN PVD coatings deposited by three techniques.
Comparative values of surface roughness, friction coefficient, and sliding wear coefficient of CrN/NbN coatings produced by H-H, H-U, and ABS techniques.
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