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Evolution of epitaxial and films during thermal oxidation of epitaxial tantalum films on sapphire substrates
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10.1116/1.2909971
/content/avs/journal/jvsta/26/3/10.1116/1.2909971
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/26/3/10.1116/1.2909971

Figures

Image of FIG. 1.
FIG. 1.

XRD scans of epitaxial Ta films on r-cut sapphire substrate with increasing oxidation time.

Image of FIG. 2.
FIG. 2.

XRD scans of a polycrystalline Ta films on silicon substrate before and after oxidation.

Image of FIG. 3.
FIG. 3.

XRD Ta(101) pole figure of Ta film (a) with each circle corresponding to a 10° increase in tilt angle.

Image of FIG. 4.
FIG. 4.

XRD and Ta(002) pole figure of the film (b) with each circle corresponding to a 10° increase in tilt angle.

Image of FIG. 5.
FIG. 5.

XRD pole figure of the film (e) with each circle corresponding to a 10° increase in tilt angle.

Image of FIG. 6.
FIG. 6.

XRD (200) and (110) pole figure of the film (e) with each circle corresponding to a 10° increase in tilt angle.

Image of FIG. 7.
FIG. 7.

Schematic diagram for two unit cells of orthorhombic structure showing the (201)plane.

Image of FIG. 8.
FIG. 8.

SEM image of the epitaxial film.

Tables

Generic image for table
TABLE I.

Summary of the deposition and oxidation conditions for the films.

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/content/avs/journal/jvsta/26/3/10.1116/1.2909971
2008-04-25
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Evolution of epitaxial Ta2O5 and Ta2O films during thermal oxidation of epitaxial tantalum films on sapphire substrates
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/26/3/10.1116/1.2909971
10.1116/1.2909971
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