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Ultralow films by using a plasma-enhanced chemical vapor deposition porogen approach: Study of the precursor reaction mechanisms
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10.1116/1.2953704
/content/avs/journal/jvsta/26/5/10.1116/1.2953704
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/26/5/10.1116/1.2953704
/content/avs/journal/jvsta/26/5/10.1116/1.2953704
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/content/avs/journal/jvsta/26/5/10.1116/1.2953704
2008-08-28
2014-12-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ultralow k films by using a plasma-enhanced chemical vapor deposition porogen approach: Study of the precursor reaction mechanisms
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/26/5/10.1116/1.2953704
10.1116/1.2953704
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