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Ultralow films by using a plasma-enhanced chemical vapor deposition porogen approach: Study of the precursor reaction mechanisms
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10.1116/1.2953704
/content/avs/journal/jvsta/26/5/10.1116/1.2953704
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/26/5/10.1116/1.2953704

Figures

Image of FIG. 1.
FIG. 1.

Mass spectra of the precursors at (N.B., signal magnification for D5 above ).

Image of FIG. 2.
FIG. 2.

Relative electron impact ionization cross section.

Image of FIG. 3.
FIG. 3.

Mass spectra for D5-CHO chemistry. For clarity, the intensity is ten times magnified above . Deposition pressure: ; temperature: ; power: .

Image of FIG. 4.
FIG. 4.

Mass spectra for DEOMS-CHO chemistry. For clarity, the intensity is magnified above . Deposition pressure: ; temperature: ; power: .

Image of FIG. 5.
FIG. 5.

Loss rate with D5 plasmas (matrix or hybrid conditions). Deposition pressure: ; temperature: .

Image of FIG. 6.
FIG. 6.

Loss rate with DEOMS plasmas (matrix or hybrid conditions). Deposition pressure: ; temperature: .

Image of FIG. 7.
FIG. 7.

FTIR spectra of films and precursors for D5-CHO chemistry.

Image of FIG. 8.
FIG. 8.

FTIR spectra of films and precursors for DEOMS-CHO chemistry.

Image of FIG. 9.
FIG. 9.

Details of FTIR spectra of hybrid films with D5 (dark line) and DEOMS (light line).

Tables

Generic image for table
TABLE I.

Bond dissociation energies in diatomic molecules (Ref. 21).

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/content/avs/journal/jvsta/26/5/10.1116/1.2953704
2008-08-28
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ultralow k films by using a plasma-enhanced chemical vapor deposition porogen approach: Study of the precursor reaction mechanisms
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/26/5/10.1116/1.2953704
10.1116/1.2953704
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