Copper ion transport induced dielectric failure: Inclusion of elastic drift and consequences for reliability
Copper interconnects with anode () and cathode (0(V)).
Concentration profiles for with and without elastic drift, , , , , , , and . At and , (with elastic drift) and (without elastic drift). The ordinate axis is split to show this.
Concentration of copper ions at cathode expressed as a function of varying (in ) with (dotted lines) and without the elastic drift (solid) term when . , , , , and .
Concentration and electric field profiles within the dielectric at the time when . The elastic drift term is included for this calculation. , , , , , and .
Time taken for the internal electric field at the cathode to increase to the breakdown strength of the dielectric, with and without the elastic drift term. , , , , , and .
Steady-state values, , of for various applied fields with and without the elastic drift term. , , , , , and .
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