Reclamation of a molecular beam epitaxy system and conversion for oxide epitaxy
Layout of laboratory space for etching the MBE system.
Temperature of etch solution with time as thermal runaway occurs.
View of the heavily coated cryopanel prior to cleaning.
Same cryopanel as in Fig. 3 after the etch process.
Detailed list of hardware both salvaged and discarded on the authors’ MBE system.
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