Ultrahigh-frequency microplasma jet as a low-power, high-density, and localized ions/radicals source
Photographs of the UHF microplasma torch and generated microplasma. (a) The microplasma torch consists of a five-turn solenoid coil for generating the electromagnetic field, a quartz capillary, and a tungsten wire which is inserted into the capillary from the left side. (b) Plasma flame generated at an input power , an Ar flow rate of 0.56 SCCM and chamber pressure .
Electron, electron excitation, and gas temperatures of the generated plasma as a function of input power.
Variations of atomic oxygen flux at the exit of the capillary with inner nozzle diameter of and pressure in the region of plasma generation as a function of gas flow rate, the ratio between and Ar flow rates in the plasma gas being a fixed value of 0.23 The chamber pressure was in all experiments.
Atomic oxygen flux in the same pressure range of various sources. Superscripts a, b, c, d, and e correspond to Refs. 21–23, 17, and 24, respectively.
Schematic of a SEM chamber with UHF microplasma for neutralizing charging effects of electrons on a specimen surface.
Scanning electron images of [(a) and (b)] nanopattern and [(c) and (d)] cellulose-diacetate fibers. [(a) and (c)] Image of charging effect when the plasma is switched off. [(b) and (d)] Neutralized charging effect on the surface by Ar ions when the plasma is switched on.
Experimental details for the plasma generation.
Article metrics loading...
Full text loading...