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Establishment of very uniform gas-flow pattern in the process chamber for microwave-excited high-density plasma by ceramic shower plate
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10.1116/1.3143665
/content/avs/journal/jvsta/27/4/10.1116/1.3143665
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/27/4/10.1116/1.3143665
/content/avs/journal/jvsta/27/4/10.1116/1.3143665
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/content/avs/journal/jvsta/27/4/10.1116/1.3143665
2009-06-04
2014-12-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Establishment of very uniform gas-flow pattern in the process chamber for microwave-excited high-density plasma by ceramic shower plate
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/27/4/10.1116/1.3143665
10.1116/1.3143665
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