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Etching of in plasmas. II. Simulation of surface roughening and local polymerization
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10.1116/1.3290766
/content/avs/journal/jvsta/28/2/10.1116/1.3290766
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/2/10.1116/1.3290766
/content/avs/journal/jvsta/28/2/10.1116/1.3290766
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/content/avs/journal/jvsta/28/2/10.1116/1.3290766
2010-02-02
2014-09-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Etching of SiO2 in C4F8∕Ar plasmas. II. Simulation of surface roughening and local polymerization
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/2/10.1116/1.3290766
10.1116/1.3290766
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