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Etch mechanism of and thin films in HBr-based inductively coupled plasmas
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10.1116/1.3294712
/content/avs/journal/jvsta/28/2/10.1116/1.3294712
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/2/10.1116/1.3294712
/content/avs/journal/jvsta/28/2/10.1116/1.3294712
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/content/avs/journal/jvsta/28/2/10.1116/1.3294712
2010-01-21
2014-09-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Etch mechanism of In2O3 and SnO2 thin films in HBr-based inductively coupled plasmas
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/2/10.1116/1.3294712
10.1116/1.3294712
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