1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Metal-organic chemical vapor deposition of aluminum oxide thin films via pyrolysis of dimethylaluminum isopropoxide
Rent:
Rent this article for
USD
10.1116/1.3294718
/content/avs/journal/jvsta/28/2/10.1116/1.3294718
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/2/10.1116/1.3294718

Figures

Image of FIG. 1.
FIG. 1.

Vapor pressures of trimethylaluminum (TMA), dimethylaluminum isopropoxide (DMAI), aluminum tri-isopropoxide (ATI).

Image of FIG. 2.
FIG. 2.

XPS survey spectrum collected from film deposited at .

Image of FIG. 3.
FIG. 3.

XPS depth profile of film deposited at .

Image of FIG. 4.
FIG. 4.

C/Al ratio in deposited films, as calculated by XPS. Films were sputter cleaned prior to analysis. Approximately 4 Å of film thickness was removed by the cleaning process.

Image of FIG. 5.
FIG. 5.

High-resolution XPS spectra collected from the region of films deposited at 417 and .

Image of FIG. 6.
FIG. 6.

Experimental (symbols) and modeled (lines) psi and delta values collected from a nominally 625 Å thick film deposited at .

Image of FIG. 7.
FIG. 7.

Index of refraction (632.8 nm) of deposited films, determined by spectroscopic ellipsometry.

Image of FIG. 8.
FIG. 8.

Film deposition rate as determined by ellipsometry.

Tables

Generic image for table
TABLE I.

Apparent activation energies observed in CVD aluminum oxide processes.

Generic image for table
TABLE II.

Comparison of fluxes from background gases and film deposition (all flux values in units of molecules ).

Loading

Article metrics loading...

/content/avs/journal/jvsta/28/2/10.1116/1.3294718
2010-01-22
2014-04-18
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Metal-organic chemical vapor deposition of aluminum oxide thin films via pyrolysis of dimethylaluminum isopropoxide
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/2/10.1116/1.3294718
10.1116/1.3294718
SEARCH_EXPAND_ITEM