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Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements
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10.1116/1.3330766
/content/avs/journal/jvsta/28/2/10.1116/1.3330766
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/2/10.1116/1.3330766

Figures

Image of FIG. 1.
FIG. 1.

(Color online) (a) Schematics of the experimental setup and (b) general principle of the PIF method.

Image of FIG. 2.
FIG. 2.

Comparison of the temporal evolution of (a) the electron density, and (b) the Ar line for two different fixed settings of the matching network corresponding to a reflected power at steady state of 45 W (black lines) and 100 W (light gray lines). The plasma parameters are: 800 W ICP power, Ar gas mixture, total flow rate of 28 SCCM, fixed throttle valve position and pressure. The pulse period is and the plasma-off time is . The Ar-line intensity has been normalized by its steady-state value.

Image of FIG. 3.
FIG. 3.

Temporal evolution of the electron density and of the Ar (750.4 nm) and lines for . The temporal origin is set to the rising edge of the TTL signal corresponding to plasma ignition after the plasma extinction time . The plasma parameters are 800 W ICP power, , fixed throttle valve position , and Ar gas mixture.

Image of FIG. 4.
FIG. 4.

Temporal evolution of the electron density normalized against its steady-state value (right vertical axis, gray curve) and of the intensity of the Ar line at 750.4 nm normalized against its steady-state value (right axis, black curve) for . The other parameters are the same as for Fig. 3.

Image of FIG. 5.
FIG. 5.

Temporal evolution (a) of the intensity of the line and (b) of the Ar line at 750.4 nm for plasma extinction times , 1, 2, and 5 ms. The intensity of the emission lines have been normalized against their steady-state values.

Image of FIG. 6.
FIG. 6.

Temporal evolution of the line intensity for and . The intensities of the emission lines have been normalized against their steady-state values. For each curve, the temporal origin is set to the rising edge of the TTL signal corresponding to plasma ignition after the plasma extinction time .

Image of FIG. 7.
FIG. 7.

Temporal evolution of the Fulcher- line at for as raw data (black line), or normalized against the Ar line at 750.4 nm (gray line). The intensities have been normalized against their steady-state values. The same curves are found for (, not shown)

Image of FIG. 8.
FIG. 8.

(Color online) Decay rate of H as a function of with (squares), and without (circles) normalization against the Ar line emission (750.4 nm). Inset: closer view of the (0–2 ms) time range, with the data recorded for (squares and circles), and (triangles). All intensities have been normalized against their steady-state values.

Image of FIG. 9.
FIG. 9.

(Color online) Decay rate of H as a function of . (circles); (squares). The contribution of dissociative excitation has not been removed.

Image of FIG. 10.
FIG. 10.

(Color online) (a) Temporal evolution of the electron-density normalized against its steady-state value in plasma, for different values. Other plasma parameters are 700 W transmitted ICP power, pressure , and 10% of Ar in the gas mixture. (b) Temporal evolution of the intensity of the Cl line and of the electron density normalized against their steady-state values for . The time origin is set as in Fig. 6.

Image of FIG. 11.
FIG. 11.

Temporal evolution of the intensity of the Ar line at 750.4 nm (dark gray line) for , and comparison with the intensity of the Ar line at 811.5 nm (light gray line). The curve is also reported for comparison (black line). All data have been normalized against their steady-state values. The time origin is set as in Fig. 6. Other parameters: , 10% of Ar in the gas mixture, and 700 W transmitted ICP power.

Image of FIG. 12.
FIG. 12.

(Color online) Temporal evolution of and of the intensities of the Ar line at 750.4 nm and the Cl line at 754.7 nm normalized against their steady-state values for (a) and (b) . The time origin is set as in Fig. 6. Other plasma parameters are pressure , 150 W ICP power, and 10% of Ar in the gas mixture.

Image of FIG. 13.
FIG. 13.

(Color online) Temporal evolution of the intensity of the Cl line at 754.7 nm normalized against the intensity of the Ar line at 750.4 nm for , 1, 2, 5, and 50 ms. The lines intensities have been normalized against their steady-state values. The time origin is set as in Fig. 6, and the plasma parameters are those of Fig. 12. Also shown is the contribution of dissociative excitation estimated for long .

Image of FIG. 14.
FIG. 14.

Cl decay curve as a function of in the (0–2 ms) time interval with the contribution of dissociative excitation ignored (black squares), and with an average contribution of dissociative excitation removed (gray circles). The data recorded with (square, circle) and (triangles) are compared for .

Image of FIG. 15.
FIG. 15.

Temporal behavior of electron density (gray line) and of the intensity of the Ar line at 750.4 nm (black line) for (a) and (b) . All data are normalized against their steady-state values. The plasma parameters are: 800 W ICP power, pressure and 10% of Ar in the gas mixture.

Image of FIG. 16.
FIG. 16.

(Color online) Temporal evolution of the intensity (a) of the Cl line at 754.7 nm and (b) of the Cl line intensity normalized against the intensity of the Ar line at 750.4 nm for , 2, 5, 10, 30, and 50 ms. The lines intensities have been normalized against their steady-state values. The time origin is set as in Fig. 6, and the plasma parameters are those of Fig. 15.

Tables

Generic image for table
TABLE I.

Total loss rate determined in the (0–2 ms) of the postdischarge from the Cl decay curve obtained with the PIF method using the Cl emission lines at 754.7, 792.5, and the 808.7 nm. The Ar line at 750.4 nm was used for the normalization. A constant contribution of dissociative excitation (found in the range of 10%–14% range) estimated for has been removed to determine the loss rate. The other plasma parameters were 800 W ICP power, 10 mTorr, and .

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/content/avs/journal/jvsta/28/2/10.1116/1.3330766
2010-03-11
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/2/10.1116/1.3330766
10.1116/1.3330766
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