X-ray photoelectron spectroscopy study of polyimide thin films with Ar cluster ion depth profiling
(Color online) XPS depth profiles and C , O , and N spectra for the PI films using (a) and (b) coronene ions.
(Color online) (a) Depth profiles of the PI films on silicon substrates using Ar cluster ions. (b) XPS spectra of C , O , and N before and after sputtering by 5 kV Ar cluster ions. (c) Overlaid N spectra during Ar cluster depth profiling of the PI films. Accelerating voltages were at (i) 2.5 kV, (ii) 5 kV, (iii) 10 kV, and (iv) 20 kV.
(Color online) Normalized sputtering rate vs the accelerating voltage.
(Color online) Curve fitting results of N XPS spectra: (a) as received and (b) 50 nm sputter depth with 20 kV Ar cluster ions.
Average atomic concentration of the PI films during depth profiles, interface width , and N damage ratio vs accelerating voltage.
Article metrics loading...
Full text loading...