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Electrostatic quadrupole plasma mass spectrometer measurements during thin film depositions using simultaneous matrix assisted pulsed laser evaporation and magnetron sputtering
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10.1116/1.3372401
/content/avs/journal/jvsta/28/3/10.1116/1.3372401
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/3/10.1116/1.3372401
/content/avs/journal/jvsta/28/3/10.1116/1.3372401
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/content/avs/journal/jvsta/28/3/10.1116/1.3372401
2010-03-26
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrostatic quadrupole plasma mass spectrometer measurements during thin film depositions using simultaneous matrix assisted pulsed laser evaporation and magnetron sputtering
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/3/10.1116/1.3372401
10.1116/1.3372401
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