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High rate reactive magnetron sputter deposition of Al-doped ZnO with unipolar pulsing and impedance control system
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10.1116/1.3308621
/content/avs/journal/jvsta/28/4/10.1116/1.3308621
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/4/10.1116/1.3308621
/content/avs/journal/jvsta/28/4/10.1116/1.3308621
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/content/avs/journal/jvsta/28/4/10.1116/1.3308621
2010-06-29
2014-07-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High rate reactive magnetron sputter deposition of Al-doped ZnO with unipolar pulsing and impedance control system
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/4/10.1116/1.3308621
10.1116/1.3308621
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