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Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography
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10.1116/1.3425639
/content/avs/journal/jvsta/28/4/10.1116/1.3425639
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/4/10.1116/1.3425639
/content/avs/journal/jvsta/28/4/10.1116/1.3425639
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/content/avs/journal/jvsta/28/4/10.1116/1.3425639
2010-06-29
2014-12-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/28/4/10.1116/1.3425639
10.1116/1.3425639
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