Structural and electrical properties of thin films deposited on ZnO by metal organic chemical vapor deposition
(Color online) Schematic of the MOCVD system for deposition. Argon gas carries the sublimed vapor from heated precursor boat to the deposition chamber through a showerhead gas distributor located above the heated substrate platen. Precursor feed line is heated to prevent condensation. Oxygen gas and water vapor are introduced through separate inlets.
(Color online) (a) and (b) are typical XRDs from thin films deposited at on ZnO film. (a) shows XRD from a film deposited on a rough ZnO surface with a rms roughness of 7.7 nm and (b) shows XRD of a film deposited on a smooth ZnO surface with a rms roughness of 3.5 nm.
(Color online) Typical SEM image of a film deposited by MOCVD at . This film was deposited on ZnO coated glass substrate at a total pressure of 2 Torr for 28 min.
(Color online) [(a)–(c)] Digital photographs and [(d)–(f)] cross sectional SEM images of films deposited at substrate temperatures of [(a) and (d)] 300, [(b) and (e)] 350, and [(c) and (f)] , respectively. Scale bars are 500 nm.
(Color online) Optical absorbance of the films shown in (a)–(f).
(Color online) Tauc plot generated from the absorption data in Fig. 5 for films deposited at 350 and .
XRD from films deposited at 300, 350, and . All films were deposited at a total pressure of 2 Torr and the film thicknesses were made similar (222, 208, and 243 nm, respectively) by adjusting the deposition times.
(Color online) (a) Grain size and lattice parameter of the films as a function of deposition temperature. Equilibrium lattice constant of is 4.267 Å. (b) Carrier concentration, carrier mobility, and (c) resistivity as a function of deposition temperature.
XRD from films deposited at the same temperature as a function of film thickness.
(Color online) (a) Grain size and lattice parameter of the films as a function of the film thickness. (b) Carrier concentration, carrier mobility, and (c) resistivity as a function of the film thickness. Deposition temperature was for all films.
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