Structure and properties of ZrN coatings deposited by high power impulse magnetron sputtering technology
Schematic representation of the deposition machine with the arrangements of the magnetrons and substrate table.
(a) Cross-sectional BF TEM image of the coating-substrate interface of the coating. (b) back scattered electron-SEM image of the scratch test conducted on coated specimen.
Bragg–Brentano XRD measurements recorded for the ZrN nitride coatings as a function of bias voltage.
(a) BF image of the top of the coating deposited at . (b) Cross-sectional view of the whole coating with the selective area diffraction pattern of the coating in the inset.
BF TEM images of the coatings deposited at (a) and (b) .
(Color online) AFM images of the as-deposited ZrN coatings showing the topography.
Characterization results measured for the ZrN coatings deposited at three different substrate bias voltages.
Color measurements of the coatings recorded with a spectrophotometer.
Article metrics loading...
Full text loading...