1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Effects of thermal annealing on the microstructure of sputtered Al2O3 coatings
Rent:
Rent this article for
USD
10.1116/1.3584803
/content/avs/journal/jvsta/29/4/10.1116/1.3584803
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/4/10.1116/1.3584803
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

TEM cross-section overview image of (a) sample A and (b) sample B in the as-deposited state.

Image of FIG. 2.
FIG. 2.

HRTEM images with SAD pattern in the as-deposited state of (a) near-interface-layer of sample A, (b) top-layer of sample A, (c) near-interface-layer of sample B, and (d) top-layer of sample B.

Image of FIG. 3.
FIG. 3.

(Color online) EELS spectra of sample A in as-deposited state taken at the near-interface and top-layer. (a) Al-L2,3 edge and (b) O-K edge. The arrow in the Al-L2,3 spectrum marks the shoulder originating from tetrahedrally coordinated Al ions.

Image of FIG. 4.
FIG. 4.

(Color online) EELS spectra of sample B in as-deposited state taken at the near-interface and top-layer. (a) Al-L2,3 edge and (b) O-K edge.

Image of FIG. 5.
FIG. 5.

Micrographs of sample A after vacuum annealing at 1000 °C for 12 h. (a) TEM cross-section overview image, (b) TEM detail of top-layer showing the formed crack network, (c) HRTEM image with SAD pattern of the near-interface-layer, and (d) HRTEM image with SAD pattern of the top-layer.

Image of FIG. 6.
FIG. 6.

Micrographs of sample B after vacuum annealing at 1000° C for 12 h. (a) TEM cross-section overview image, (b) HRTEM image with SAD pattern of the near-interface-layer, and (c) HRTEM image with SAD pattern of the top-layer.

Image of FIG. 7.
FIG. 7.

(Color online) EELS spectra of sample A after vacuum annealing at 1000° C for 12 h taken at the near-interface-layer and top-layer. (a) Al-L2,3 edge and (b) O-K edge.

Image of FIG. 8.
FIG. 8.

(Color online) EELS spectra of sample B after vacuum annealing at 1000° C for 12 h taken at the near-interface-layer and top-layer. (a) Al-L2,3 edge and (b) O-K edge.

Image of FIG. 9.
FIG. 9.

Schematic summarizing the cross-sectional microstructure of sputtered alumina coatings grown under low-energy ion bombardment (sample A) and under intense ion bombardment (sample B) in the as-deposited [(a) and (c)] and annealed [(b) and (d)] condition.

Loading

Article metrics loading...

/content/avs/journal/jvsta/29/4/10.1116/1.3584803
2011-06-02
2014-04-17
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of thermal annealing on the microstructure of sputtered Al2O3 coatings
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/4/10.1116/1.3584803
10.1116/1.3584803
SEARCH_EXPAND_ITEM