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Aging mechanism of the native oxide on silicon (100) following atmospheric oxygen plasma cleaning
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10.1116/1.3597436
/content/avs/journal/jvsta/29/4/10.1116/1.3597436
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/4/10.1116/1.3597436

Figures

Image of FIG. 1.
FIG. 1.

Schematic of the plasma cleaning apparatus.

Image of FIG. 2.
FIG. 2.

Infrared reflectance spectra acquired during aging of the silicon native oxide surface cleaned with RCA SC-1 and plasma.

Image of FIG. 3.
FIG. 3.

Infrared reflectance spectrum of the C–H stretching region for silicon cleaned with plasma following 60 h of aging.

Image of FIG. 4.
FIG. 4.

Infrared reflectance spectra of the O–H stretching region for silicon cleaned with (a) RCA SC-1, (b) plasma, and (c) RCA SC-1 with plasma.

Image of FIG. 5.
FIG. 5.

Dependence of the water contact angle on the time for the native oxide of Si (100) aging under a nitrogen purge.

Image of FIG. 6.
FIG. 6.

Fraction of vacant sites corresponding to O–H groups during aging of the silicon native oxide surface.

Image of FIG. 7.
FIG. 7.

Fractional coverage of C–H stretching groups during aging of the silicon native oxide surface.

Tables

Generic image for table
TABLE I.

Properties of the infrared spectrum collected after 36 h of aging.

Generic image for table
TABLE II.

Rate parameters obtained by fitting Eq. (1) to the water contact angle data.

Generic image for table
TABLE III.

Rate parameters obtained by fitting Eqs. (3) and (5) to the infrared data.

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/content/avs/journal/jvsta/29/4/10.1116/1.3597436
2011-06-23
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Aging mechanism of the native oxide on silicon (100) following atmospheric oxygen plasma cleaning
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/4/10.1116/1.3597436
10.1116/1.3597436
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