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Modelling of fluorine based high density plasma for the etching of silica glasses
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10.1116/1.3624786
/content/avs/journal/jvsta/29/5/10.1116/1.3624786
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/5/10.1116/1.3624786
/content/avs/journal/jvsta/29/5/10.1116/1.3624786
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/content/avs/journal/jvsta/29/5/10.1116/1.3624786
2011-08-22
2014-11-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Modelling of fluorine based high density plasma for the etching of silica glasses
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/5/10.1116/1.3624786
10.1116/1.3624786
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