1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Process-structure-property correlations in pulsed dc reactive magnetron sputtered vanadium oxide thin films
Rent:
Rent this article for
USD
10.1116/1.3636372
/content/avs/journal/jvsta/29/6/10.1116/1.3636372
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/6/10.1116/1.3636372
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Pulse dc profile that was used to deposit VO x thin films. The frequency of the pulse is 20 kHz.

Image of FIG. 2.
FIG. 2.

(Color online) Variation of cathode current as a function of (a) oxygen percentage and (b) total gas flow.

Image of FIG. 3.
FIG. 3.

(Color online) X-ray diffraction spectra of films deposited at (a) 5% O2 at various flow rates and (b) 18 sccm at various oxygen percentages. Peaks that are denoted with an asterisk (*) are from substrate.

Image of FIG. 4.
FIG. 4.

Cross-sectional FESEM images of samples deposited at 5% O2 at different flow rates (a) 31 sccm, (b) 65 sccm, and (c) 90 sccm.

Image of FIG. 5.
FIG. 5.

(Color online) Raman spectra of samples deposited at 5% O2 with variable total flow rates along forward and reverse paths of the cathode current hysteresis curve. All spectra were normalized with respect to the low frequency peak intensity for comparison purposes.

Image of FIG. 6.
FIG. 6.

(Color online) Resistivity of the VO x films as a function of (a) total flow rates and (b) oxygen percentages.

Image of FIG. 7.
FIG. 7.

(Color online) Temperature coefficient of resistance of the VO x films as a function of (a) total flow rates and (b) oxygen percentages.

Image of FIG. 8.
FIG. 8.

(Color online) Dependence of resistivity on cathode current in the pulse dc sputtering. Linear dependence of resistivity (region 2) on cathode current in these films can be noticed between metallic (region 1) and oxidized (region 3) regimes.

Image of FIG. 9.
FIG. 9.

(Color online) Meyer–Neldel relation in the VO x samples deposited at (a) fixed total flow rate (18 sccm) and (b) fixed oxygen percentage (5%).

Loading

Article metrics loading...

/content/avs/journal/jvsta/29/6/10.1116/1.3636372
2011-09-16
2014-04-18
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Process-structure-property correlations in pulsed dc reactive magnetron sputtered vanadium oxide thin films
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/6/10.1116/1.3636372
10.1116/1.3636372
SEARCH_EXPAND_ITEM