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Effects of the magnetic field strength on the modulated pulsed power magnetron sputtering of metallic films
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10.1116/1.3645612
/content/avs/journal/jvsta/29/6/10.1116/1.3645612
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/6/10.1116/1.3645612
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Typical target voltage waveforms and parameters of (a) HPPMS and (b) MPP.

Image of FIG. 2.
FIG. 2.

Schematic drawing of the deposition system and the experimental setup.

Image of FIG. 3.
FIG. 3.

(Color online) Typical 750 μs MPP pulse used in this study.

Image of FIG. 4.
FIG. 4.

(Color online) (a) Deposition rates of the DCMS and MPP Cr depositions at different magnetic field strengths, and (b) the ratio of the MPP deposition rate to the DCMS deposition rate for Cr at different magnetic field strengths.

Image of FIG. 5.
FIG. 5.

(Color online) Ratio of the MPP deposition rate to the DCMS deposition rate for five target materials (Cu, Al, Cr, Ti, Ta) at different magnetic field strengths: (a) B = 550 G and (b) B = 350 G.

Image of FIG. 6.
FIG. 6.

(Color online) (a) Peak target voltage and (b) peak current changes on the Cr target during the DCMS and MPP depositions of Cr films at different magnetic field strengths.

Image of FIG. 7.
FIG. 7.

(Color online) (a) Ion mass distributions, (b) ion energy distributions of Ar+, and (c) ion energy distributions of Cr+ for the MPP Cr film depositions at different magnetic field strengths.

Image of FIG. 8.
FIG. 8.

(Color online) (a) Deposition rate and peak target current as a function of the repetition frequency and (b) the changes of the deposition rate and repetition frequency by varying the pulse length for the MPP Cr depositions.

Image of FIG. 9.
FIG. 9.

Top view SEM micrographs of the Cr films deposited by (a) DCMS at B = 550 G, and MPP at different magnetic field strengths (b) 550 G, (c) 450 G, and (d) 350 G.

Image of FIG. 10.
FIG. 10.

(Color online) Hardness of (a) the DCMS and (b) the MPP Cr films deposited at different magnetic field strengths.

Image of FIG. 11.
FIG. 11.

(Color online) Sublimation temperature of the five target materials as a function of the equilibrium vapor pressure.

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/content/avs/journal/jvsta/29/6/10.1116/1.3645612
2011-10-26
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of the magnetic field strength on the modulated pulsed power magnetron sputtering of metallic films
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/6/10.1116/1.3645612
10.1116/1.3645612
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