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Properties of double-layered Ga-doped Al-zinc-oxide/titanium-doped indium–tin-oxide thin films prepared by dc magnetron sputtering applied for Si-based thin film solar cells
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10.1116/1.3651099
/content/avs/journal/jvsta/29/6/10.1116/1.3651099
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/6/10.1116/1.3651099

Figures

Image of FIG. 1.
FIG. 1.

(Color online) (a) Transmittance spectra in the visible region (350–950 nm) with ITIO films at different annealing times. (b) The SEM image of the ITIO films annealed for 30 min. (c) The SEM image of the ITIO films without annealing. (d) Average optical transmittance in the ITIO films vs the GAZO/annealed-ITIO double layered film.

Image of FIG. 2.
FIG. 2.

Haze value for the ITIO samples with different annealing times at 350 °C and the GAZO film coated on the ITIO samples without any annealing.

Image of FIG. 3.
FIG. 3.

SEM images of the top view of the GAZO/annealed ITIO with an annealing time of (a) 10, (b) 30, and (c) 60 min; (d) the cross-section view of the GAZO/30 min-annealed ITIO deposited onto the glass substrate.

Image of FIG. 4.
FIG. 4.

Electrical resistivity of ITIO films grown with different annealing times and the GAZO film deposited onto the ITIO samples without any annealing.

Image of FIG. 5.
FIG. 5.

(a) Structure of the p-i-n a-Si:H thin film solar cell, and (b) current-voltage characteristics of the p-i-n a-Si:H solar cells under illumination.

Image of FIG. 6.
FIG. 6.

Measured EQE of a single-junction a-Si:H thin film solar cell without annealing for GAZO film deposition onto ITIO samples at different annealing times.

Tables

Generic image for table
TABLE I.

External parameters of a-Si:H thin film solar cells with a double layer of GAZO/annealed-ITIO (10, 30, 60, and 120 min) thin-film.

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/content/avs/journal/jvsta/29/6/10.1116/1.3651099
2011-11-03
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Properties of double-layered Ga-doped Al-zinc-oxide/titanium-doped indium–tin-oxide thin films prepared by dc magnetron sputtering applied for Si-based thin film solar cells
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/29/6/10.1116/1.3651099
10.1116/1.3651099
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