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Wetting properties induced in nano-composite POSS-MA polymer films by atomic layer deposited oxides
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10.1116/1.3639134
/content/avs/journal/jvsta/30/1/10.1116/1.3639134
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3639134
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Structure of the POSS-MA polymer.

Image of FIG. 2.
FIG. 2.

(Color online) Water contact angle (WCA) of ALD Al2O3-coated POSS-MA films on silicon measured the day after they were coated at 115, 90, 60, and 40 °C with 5, 20, 40, and 60 ALD Al2O3 cycles. The horizontal line represents the WCA value for an uncoated POSS-MA film.

Image of FIG. 3.
FIG. 3.

(Color online) Transmission absorbance FTIR spectra of a POSS-MA film on silicon the day after they were coated with 5, 20, 40, and 60 cycles of ALD Al2O3 at 90 °C. The characteristic peaks of the Al2O3 layer (Al-O (Ref. 17)) and the POSS-MA film (Si-O-Si (Refs. 18–20, C=O (Refs. 20–22), and CH3-CH2 (Refs. 18 and 23)) are labeled. The hydroxyl–(OH) groups between 4000 and 3000 cm−1 appear after the ALD coating process is performed.

Image of FIG. 4.
FIG. 4.

(Color online) Ratio between the Al-O and the CH3-CH2 peaks in FTIR absorbance spectra of ALD Al2O3-coated POSS-MA films on silicon measured the day after they were coated at 115, 90, 60, and 40 °C with 5, 20, 40, and 60 ALD cycles of Al2O3.

Image of FIG. 5.
FIG. 5.

(Color online) Transmission absorbance FTIR spectra of a POSS-MA film on silicon after they were heated at 115 °C for a time interval corresponding to 5, 20, 40, and 60 ALD cycles, i.e., 8, 31, 62, and 92 min, respectively. The four panels focus on the spectra in the whole middle IR region (a), around the Si–O–Si (b), the C = O, and the CH3–CH2 (d) peaks.

Image of FIG. 6.
FIG. 6.

Scanning electron micrograph of an ALD Al2O3-coated POSS-MA films on silicon. The Al2O3 coating was deposited at 115 °C with 60 cycles.

Image of FIG. 7.
FIG. 7.

(Color online) (a) Schematics of the two samples whose compositional profile was measured by XPS. (b) XPS survey scans of the POSS-MA films on silicon coated with ALD Al2O3 layers deposited at 115 °C with 60 cycles after sputtering for 10 min, and five cycles after sputtering for 15 min. Counts per second (CPS) are reported on the vertical axis. An offset of 3 × 104 CPS was given to the samples coated with 5 cycles of ALD Al2O3 to make its features more clearly distinguishable. The more significant atomic species are labeled. (c) Atomic percentage (%) vs sputter time (in minutes) for the POSS-MA films on silicon coated with ALD Al2O3 layers deposited at 115 °C with 60 (empty symbols) and 5 cycles (full symbols). The more significant atomic species are labeled.

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/content/avs/journal/jvsta/30/1/10.1116/1.3639134
2011-09-20
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Wetting properties induced in nano-composite POSS-MA polymer films by atomic layer deposited oxides
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3639134
10.1116/1.3639134
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