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Impact of electrode roughness on metal-insulator-metal tunnel diodes with atomic layer deposited Al2O3 tunnel barriers
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10.1116/1.3658380
/content/avs/journal/jvsta/30/1/10.1116/1.3658380
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3658380
/content/avs/journal/jvsta/30/1/10.1116/1.3658380
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/content/avs/journal/jvsta/30/1/10.1116/1.3658380
2011-11-03
2014-09-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Impact of electrode roughness on metal-insulator-metal tunnel diodes with atomic layer deposited Al2O3 tunnel barriers
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3658380
10.1116/1.3658380
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