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Molecular layer deposition of polyethylene terephthalate thin films
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10.1116/1.3662846
/content/avs/journal/jvsta/30/1/10.1116/1.3662846
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3662846
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Illustration of surface chemistry for PET MLD on O-H terminated silicon.

Image of FIG. 2.
FIG. 2.

Illustration of surface chemistry for PET MLD on amine-terminated silicon.

Image of FIG. 3.
FIG. 3.

Possible structures of functionalization on hydroxylated silica surface (adapted from Ref. 4).

Image of FIG. 4.
FIG. 4.

Growth rate of PET films as a function of the precursor pulse width at 145 °C. Both precursor pulses have the same width.

Image of FIG. 5.
FIG. 5.

Growth rate of PET films as a function of the deposition temperature. Precursor pulse width was 15 s.

Image of FIG. 6.
FIG. 6.

Thickness of PET films as a function of number of cycles at 145 °C. The precursor pulse length was 15 s for both precursors. The dotted line shows the effect of the APS layer plus the native oxide.

Image of FIG. 7.
FIG. 7.

FTIR spectra of (a) reference PET and (b) PET thin films after 50 cycles MLD deposited at 145 °C.

Image of FIG. 8.
FIG. 8.

(Color online) AFM images of (a) initial silicon oxide (b) pretreated APS surface and (c) 18 nm thick PET film deposited at 145 °C.

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/content/avs/journal/jvsta/30/1/10.1116/1.3662846
2011-11-23
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Molecular layer deposition of polyethylene terephthalate thin films
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3662846
10.1116/1.3662846
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