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Atomic layer deposition of Al2O3 on V2O5 xerogel film for enhanced lithium-ion intercalation stability
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10.1116/1.3664115
/content/avs/journal/jvsta/30/1/10.1116/1.3664115
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3664115
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

X-ray diffraction pattern of V2O5 xerogel film fabricated at room temperature, showing the existence of only hydrous vanadium oxide.

Image of FIG. 2.
FIG. 2.

(Color online) (a) High to middle frequency region of AC impedance spectra presented as Nyquist plots of bare V2O5 film and V2O5 films after Al2O3 deposition of different cycles measured in 1 M LiClO4 in propylene carbonate and (b) the equivalent circuit used to fit the EIS data.

Image of FIG. 3.
FIG. 3.

(Color online) Cyclic voltammetry curves in the first, thirtieth and fiftieth cycles of (a) bare V2O5 film, (b) Al2O3-5 film, (c) Al2O3-10 film, and (d) Al2O3-20 film measured in 1 M LiClO4 in propylene carbonate with a scan rate of 10 mVs-1 in a voltage range between 0.6 V and − 1.4 V vs Ag/AgCl.

Image of FIG. 4.
FIG. 4.

(Color online) Chronopotentiometric discharge/charge curves in the (a) first, (b) thirtieth, and (c) fiftieth cycles of bare V2O5 film and Al2O3 deposited films. (d) Li-ion intercalation discharge capacity of bare V2O5 film and Al2O3 deposited films as a function of cyclic numbers. The measurements were carried out in a potential window between 0.6 V and −1.4 V vs Ag/AgCl at a current density of 600 mAg−1.

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/content/avs/journal/jvsta/30/1/10.1116/1.3664115
2011-11-29
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Atomic layer deposition of Al2O3 on V2O5 xerogel film for enhanced lithium-ion intercalation stability
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3664115
10.1116/1.3664115
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