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Nanoscratch testing of atomic layer deposition and magnetron sputtered TiO2 and Al2O3 coatings on polymeric substrates
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10.1116/1.3665418
/content/avs/journal/jvsta/30/1/10.1116/1.3665418
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3665418

Figures

Image of FIG. 1.
FIG. 1.

On-load and residual depth curves for ALD aluminum oxide coatings on PC and PMMA substrates after scratch testing with 25 μm radius indenter (60 mN max load).

Image of FIG. 2.
FIG. 2.

SEM micrograph of “high load” region of scratch track for ALD aluminum oxide coating on PC substrate (25 μm radius indenter, 60 mN max load).

Image of FIG. 3.
FIG. 3.

On-load and residual depth curves for ALD aluminum oxide coatings on PEN and PET substrates after scratch testing with 25 μm radius indenter (60 mN max load).

Image of FIG. 4.
FIG. 4.

On-load and residual depth curves for ALD aluminum oxide coatings on silicon substrate after scratch testing with 25 μm radius indenter (60 mN max load).

Image of FIG. 5.
FIG. 5.

On-load and residual depth curves for sputtered TiO2 coatings on PET substrates after scratch testing with 25 μm radius indenter (60 mN max load).

Image of FIG. 6.
FIG. 6.

On-load and residual depth curves for ALD TiO2 coatings on PEN substrates after scratch testing with 10 μm radius indenter (100 mN max load).

Image of FIG. 7.
FIG. 7.

(Color online) Optical micrograph of “high load” region of scratch track for ALD TiO2 coating on PC substrate (10 μm radius indenter, 100 mN max load).

Image of FIG. 8.
FIG. 8.

On-load and residual depth curves for ALD TiO2 coatings on a silicon substrate after scratch testing with 10 μm radius indenter (350 mN max load).

Image of FIG. 9.
FIG. 9.

Variation in critical load for the onset of nonelastic behavior with loading rate for ALD TiO2 coatings on PET substrates (10 μm radius indenter, 100 mN max load).

Image of FIG. 10.
FIG. 10.

Friction output from nanoscratch tests of ALD Al2O3 coatings on PEN and silicon substrates (25 μm radius indenter, 60 mN max load).

Tables

Generic image for table
TABLE I.

Nanoscratch test data for ALD and magnetron sputtered Al2O3 coatings on polymeric substrates, using a 25 μm radius diamond indenter. L y —critical load for the onset of nonelastic behavior, h r /h t —ratio of residual depth to on-load depth, P m —contact pressure at 60 mN load.

Generic image for table
TABLE II.

Nanoscratch test data for ALD and magnetron sputtered TiO2 coatings on polymeric substrates, using a 25 μm radius diamond indenter.

Generic image for table
TABLE III.

Nanoscratch test data for ALD Al2O3 and TiO2 coatings on PET and PEN substrates, using a 10 μm radius diamond indenter.

Generic image for table
TABLE IV.

Contact pressure at onset of non-elastic behavior for ALD Al2O3 and TiO2 coatings.

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/content/avs/journal/jvsta/30/1/10.1116/1.3665418
2011-12-05
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nanoscratch testing of atomic layer deposition and magnetron sputtered TiO2 and Al2O3 coatings on polymeric substrates
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3665418
10.1116/1.3665418
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