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Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NH x radical formation
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10.1116/1.3666034
/content/avs/journal/jvsta/30/1/10.1116/1.3666034
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3666034

Figures

Image of FIG. 1.
FIG. 1.

Schematic figure of the deposition apparatus.

Image of FIG. 2.
FIG. 2.

Flow chart of the Monte Carlo simulation.

Image of FIG. 3.
FIG. 3.

(Color online) GPC with exposure to varying amounts of precursors in a cycle.

Image of FIG. 4.
FIG. 4.

(Color online) (a) XPS spectrum of the cobalt film formed by HW-ALD at 300 °C and, (b) concentration of carbon measured in the cobalt film by XPS.

Image of FIG. 5.
FIG. 5.

(Color online) Cross-sectional views of the Co film formed on the trench at (a) 300 °C and (b) 150 °C. The width of the trench is 500 nm and the depth of trench is 5500 nm.

Image of FIG. 6.
FIG. 6.

(Color online) Thickness profile of the trench fitted by single species or multiple species. Each number in parentheses corresponds to the estimated sticking probability.

Image of FIG. 7.
FIG. 7.

(Color online) Sticking probabilities obtained by fitting the trench profiles shown in Fig. 5.

Image of FIG. 8.
FIG. 8.

(Color online) Time evolution of the Q-mass signal of the exhaust gas.

Image of FIG. 9.
FIG. 9.

(Color online) Gas-phase reaction estimated using the CHEMKIN-PRO software package.

Image of FIG. 10.
FIG. 10.

(Color online) GPC with various distances between the filament and substrate.

Image of FIG. 11.
FIG. 11.

(Color online) Time evolution of the Q-mass signal of m/z = 17, 66, 67, and 70 in the exhaust gas.

Tables

Generic image for table
TABLE I.

Deposition condition.

Generic image for table
TABLE II.

Relation between the relative film thickness at the bottom of the trench and deposition temperature.

Generic image for table
TABLE III.

Results of deposition experiments using various reducing reagents.

Generic image for table
TABLE IV.

The main reactions in gas phase.

Generic image for table
TABLE V.

Estimated dissociation energy by quantum chemical calculation in units of kcal/mol.

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/content/avs/journal/jvsta/30/1/10.1116/1.3666034
2011-12-14
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3666034
10.1116/1.3666034
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