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Role of surface intermediates in enhanced, uniform growth rates of TiO2 atomic layer deposition thin films using titanium tetraisopropoxide and ozone
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10.1116/1.3669522
/content/avs/journal/jvsta/30/1/10.1116/1.3669522
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3669522
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Representation of the pressure within the mini-reactor during three different runs using an over-saturating dose of ozone and (a) conventional ALD cycle using a single μpulse of TTIP, (b) 3 μpulses of TTIP “in parallel,” and (c) 3 μpulses of TTIP “in series.” D1 and D2 indicate TTIP and ozone exposures, respectively; P1 indicates purge times separating each half cycle, and P2 indicates a 10 sec delay between μpulses during an “in series” dose.

Image of FIG. 2.
FIG. 2.

Plot shows film thickness as a function of ALD cycle number for a single μpulse of TTIP (0.55 μmols) and an over-saturating dose of ozone (1.82 μmols) while the substrate temperature was maintained at 200 °C. Linear regression demonstrates a growth rate of ∼0.65 Å/cycle.

Image of FIG. 3.
FIG. 3.

(Color online) Growth rates as a function of the number of TTIP molecules when doses are introduced as a single μpulse, “in parallel” or “in series.” Demonstrates an increase in molecules leads to higher growth rates; however, TTIP doses introduced “in series” have lower growth rates as opposed to their “in parallel” counterparts.

Image of FIG. 4.
FIG. 4.

(Color online) Highly uniform films of TiO2 ALD deposited across planar wafers for 250 cycles for three different dosing schemes.

Image of FIG. 5.
FIG. 5.

(Color online) Growth rates as a function of TTIP purge time for (a) a single μpulse and (b) 3 μpulse “in parallel” of TTIP.

Image of FIG. 6.
FIG. 6.

(Color online) Highly uniform films of TiO2 ALD deposited across planar wafers for different purge times after 3 μpulse of TTIP introduced “in parallel.”

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/content/avs/journal/jvsta/30/1/10.1116/1.3669522
2011-12-15
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Role of surface intermediates in enhanced, uniform growth rates of TiO2 atomic layer deposition thin films using titanium tetraisopropoxide and ozone
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/1/10.1116/1.3669522
10.1116/1.3669522
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