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In/ITO whisker and optoelectronic properties of ITO films deposited by ion beam sputtering
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10.1116/1.4716468
/content/avs/journal/jvsta/30/4/10.1116/1.4716468
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/4/10.1116/1.4716468
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Figures

Image of FIG. 1.
FIG. 1.

GIXRD (Cu Kα) traces for ITO deposited on soda-lime glass at 150 °C for 2 h, at oxygen flow rates of 0.5, 1.0, 1.5, and 2.0 sccm. The data show the co-existence of In at relatively low oxygen flow rates.

Image of FIG. 2.
FIG. 2.

XPS spectra of the (a) In 3d, (b) Sn 3d, and (c) O 1s peaks for an ITO film deposited at 150 °C, at 0.5 sccm oxygen flow rate.

Image of FIG. 3.
FIG. 3.

SEM images showing the top-view of the deposit on glass, using ion beam sputtering on an ITO target at 150 °C for 2 h, at an oxygen flow rate of (a) 0.5 sccm, (b) 1.0 sccm, (c) 1.5 sccm, and (d) 2.0 sccm. The inset in part (a) shows the cross-sectional view of the ITO whiskers.

Image of FIG. 4.
FIG. 4.

TEM images of a representative curved In/ITO whisker retrieved from the deposit sputtered at 150 °C, at 0.5 sccm oxygen flow rate. (a) Bright field image (BFI), (b) lattice image of the stem of a whisker with well-developed {002} surface, as shown on edge in the zone axis, (c) lattice image of the globular tip on the ITO whisker; (d) and (e) show the 2D Fourier transform from the dotted white square and the dotted black square of part (c), respectively. (f) Point count EDX spectrum of an In/ITO whisker with Cu counts from the specimen holder and C counts from the carbon-coated colloidion film.

Image of FIG. 5.
FIG. 5.

Optical transmission spectra of ITO samples grown on glass substrate at a substrate temperature of 150 °C, with oxygen flow rates of 0.5, 1.0, 1.5, and 2.0 sccm.

Image of FIG. 6.
FIG. 6.

Dependence of resistivity on oxygen flow rate, for the deposited ITO films.

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/content/avs/journal/jvsta/30/4/10.1116/1.4716468
2012-05-15
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In/ITO whisker and optoelectronic properties of ITO films deposited by ion beam sputtering
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/30/4/10.1116/1.4716468
10.1116/1.4716468
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