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Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
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10.1116/1.4767813
/content/avs/journal/jvsta/31/1/10.1116/1.4767813
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/1/10.1116/1.4767813
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of the in situ hydrogen plasma process during ZnO deposition.

Image of FIG. 2.
FIG. 2.

Resistivity of the ZnO thin films deposited as functions of the hydrogen plasma (a) power and (b) exposure time.

Image of FIG. 3.
FIG. 3.

Electrical properties (carrier concentration and hall mobility) of the ZnO thin films deposited as a function of hydrogen plasma (a) power and (b) exposure time.

Image of FIG. 4.
FIG. 4.

(Color online) XRD patterns obtained from the ZnO thin films deposited with hydrogen plasma at different plasma (a) powers and (b) times.

Image of FIG. 5.
FIG. 5.

(Color online) O1s XPS peaks of ZnO film with a hydrogen plasma power of (a) 0 W, (b) 50 W, (c) 100 W, and (d) 200 W.

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/content/avs/journal/jvsta/31/1/10.1116/1.4767813
2012-11-27
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/1/10.1116/1.4767813
10.1116/1.4767813
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